Recent Trends in Optical Lithography
نویسندگان
چکیده
VOLUME 14, NUMBER 2, 2003 LINCOLN LABORATORY JOURNAL 221 O , of patterning, has enabled semiconductor devices to progressively shrink since the inception of integrated circuits more than three decades ago. Throughout the 1980s and 1990s, the trend of miniaturization continued unabated and even accelerated. Current semiconductor devices are being mass produced with 130-nm dense features; by 2007 these devices will have 65-nm dense features. Optical lithography has been, and will remain for the foreseeable future, the critical technology that makes this trend possible. (To learn the fundamentals of optical lithography, see the sidebar entitled “Optical Lithography Primer.”) In 1993, a consortium of semiconductor manufacturers called SEMATECH (for Semiconductor Manufacturing Technology) began periodically pubRecent Trends in Optical Lithography
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